Ti3SiC2-Formation During Ti–C–Si Multilayer Deposition by Magnetron Sputtering at 650 °C
Vacuum - United Kingdom
doi 10.1016/j.vacuum.2013.01.003
Full Text
Open PDFAbstract
Available in full text
Date
July 1, 2013
Authors
Publisher
Elsevier BV
Available in full text
July 1, 2013
Elsevier BV