Amanote Research
Register
Sign In
Bottom Antireflective Coatings (BARCs) for 157-Nm Lithography
doi 10.1117/12.485334
Full Text
Open PDF
Abstract
Available in
full text
Date
June 25, 2003
Authors
Liu He
Rama Puligadda
Joyce Lowes
Michael D. Rich
Publisher
SPIE
Related search
A Study of an Organic Bottom Antireflective Coating for 157-Nm Lithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Bottom Anti-Reflective Coatings for DUV Lithography.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
A New Monocyclic Fluoropolymer for 157-Nm Photoresists
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Antireflective Bilayer Coatings Based on Al2O3 Film for UV Region
Materials Science-Poland
Mechanics of Materials
Materials Science
Condensed Matter Physics
Mechanical Engineering
New Antireflective Coating Materials Containing a Novel Chromophore for KrF Laser Lithography.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Fluorinated Chemically Amplified Dissolution Inhibitors for 157 Nm Nanolithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Phase-Shift Mask Issues for 193-Nm Lithography
Microstructured ZnO Coatings Combined With Antireflective Layers for Light Management in Photovoltaic Devices
Progress in Photovoltaics: Research and Applications
Electronic Engineering
Condensed Matter Physics
Renewable Energy
Sustainability
Optical
Electrical
Magnetic Materials
Electronic
the Environment
Studies and Testing of Antireflective (AR) Coatings for Soda-Lime Glass. Final Report