Nanochemistry and Structure of Zr and Hf Based High Dielectric Constant Films

Microscopy and Microanalysis - United Kingdom
doi 10.1017/s1431927603442335
Full Text
Abstract

Available in full text

Categories
Instrumentation
Date
Authors
Publisher

Cambridge University Press (CUP)

Related search

Thermal Stability of Hf-Based High-Κ Dielectric Films on Si(100)

Microscopy and Microanalysis
Instrumentation
2003English

Magnetic Properties of Fe-M-O(M=Zr, Hf) Films With High Resistivity.

Journal of the Magnetics Society of Japan
1994English

Temperature Effects of Constant Bias Stress on NFETs With Hf-Based Gate Dielectric

2004English

The Measurement of the Dielectric Constant of Polymeric Films at High Fields

1992English

Structure and Magnetic Properties of Fe-Hf-O Sputtered Films With High Electrical Resistivity

Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals
Mechanics of MaterialsAlloysMaterials ChemistryCondensed Matter PhysicsMetals
1993English

Dielectric Relaxation in Polyimide Nanofoamed Films With Low Dielectric Constant

Applied Physics Letters
AstronomyPhysics
2008English

Electronic Structure and X-Ray Photoemission Spectra of MPtSn (M = Ti, Zr, Hf)

Acta Physica Polonica A
AstronomyPhysics
2009English

Formation and Structure of V–Zr Amorphous Alloy Thin Films

Acta Materialia
AlloysPlasticsPolymersMetalsOpticalMagnetic MaterialsCompositesElectronicCeramics
2015English

Structure and Superconducting Properties of Nb-Zr Alloy Films Made by a High-Rate Sputtering

Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals
Mechanics of MaterialsAlloysMaterials ChemistryCondensed Matter PhysicsMetals
1978English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2024 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy