Microfabrication and Plating. Photo Lithography. Photoresist.

Journal of the Surface Finishing Society of Japan

doi 10.4139/sfj.46.778

Full Text

Abstract

Available in

Date

January 1, 1995

Authors

Hiroshi KOMANO

Publisher

The Surface Finishing Society of Japan

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Microfabrication and Plating. Photo Lithography. Photoresist.

Journal of the Surface Finishing Society of Japan

Full Text

Abstract

Date

Authors

Publisher

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Use of Interferometric Lithography to Characterize the Spatial Resolution of a Photoresist Film

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Microfluidics Without Microfabrication

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Photocatalytic Reaction and Surface Photoreaction on Ultra-Fine Semiconductor Particles. Area Selective Photo-Plating Using Semiconductor Ultrafine Particles.