Amanote Research

Amanote Research

    RegisterSign In

Current Technology of ECR Plasma CVD.

Journal of the Surface Finishing Society of Japan
doi 10.4139/sfj.41.871
Full Text
Open PDF
Abstract

Available in full text

Date

January 1, 1990

Authors
Takashi AKAHORIShigenori OZAKISatoshi NAKAYAMA
Publisher

The Surface Finishing Society of Japan


Related search

Preparation of TiN Films by ECR Plasma CVD

1991English

Powerful Neutron Generators Based on High Current ECR Ion Sources With Gyrotron Plasma Heating

EPJ Web of Conferences
AstronomyPhysics
2017English

Structural and Electronic Properties of Nanocrystalline Silicon Thin Film Solar Cells Fabricated by Hot Wire and ECR-plasma CVD Techniques

English

Modelling RF-plasma Interaction in ECR Ion Sources

EPJ Web of Conferences
AstronomyPhysics
2017English

Plasma-Enhanced CVD Dopes Carbon Into WS2

MRS Bulletin
Materials ScienceTheoretical ChemistryCondensed Matter PhysicsPhysical
2019English

Thermal Plasma CVD of SiC Under Reduced Pressure

Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals
Mechanics of MaterialsAlloysMaterials ChemistryCondensed Matter PhysicsMetals
1992English

Hard Carbon Film Coating by Plasma CVD.

SHINKU
1988English

Intermittent Behavior of Local Electron Temperature in a Linear ECR Plasma

Plasma and Fusion Research
Condensed Matter Physics
2015English

Preparation and Magnetic Properties of FexN From Plasma Generated by ECR Discharge.

Journal of the Magnetics Society of Japan
1987English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2025 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy