Formation of Fe2O3-TiO2 Thin Oxide Films by Low Pressure MOCVD and Evaluation of Their Corrosion Resistance

Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals - Japan
doi 10.2320/jinstmet1952.60.6_600
Full Text
Abstract

Available in full text

Date
Authors
Publisher

Japan Institute of Metals

Related search

Preparation of High-Tc Complex Oxide Thin Films by MOCVD.

SHINKU
1995English

Preparation of TiO2-ZrO2 Films by MOCVD.

NIPPON KAGAKU KAISHI
1990English

Formation of ZrO2 Films by Low Pressure CVD Using ZTI-O2 System and Evaluation of Corrosion Resistances of the Films

Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals
Mechanics of MaterialsAlloysMaterials ChemistryCondensed Matter PhysicsMetals
1992English

High Electron-Mobility ZnSe Films Grown by Low-Pressure MOCVD

1985English

Stabilization of Epitaxial Fe2O3 Thin Films Grown by Pulsed Laser Deposition on Oxide Substrates

English

Corrosion Resistant Coatings of Multiple Layer Thin Oxide Films

Corrosion Engineering
Materials ScienceEngineering
1989English

Nano-Oxide Formation by in Situ Oxidation of Copper Thin Films

Microscopy and Microanalysis
Instrumentation
2003English

Low Temperature MoCVD Routes to Thin Films From Transition Metal Precursors

Materials Research Society Symposium - Proceedings
Mechanics of MaterialsMaterials ScienceCondensed Matter PhysicsMechanical Engineering
1989English

Properties and Orientation of Antiferroelectric Lead Zirconate Thin Films Grown by MOCVD

Materials Research Society Symposium - Proceedings
Mechanics of MaterialsMaterials ScienceCondensed Matter PhysicsMechanical Engineering
1998English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2024 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy