(PDF) A New Model for the Etching Characteristics of

A New Model for the Etching Characteristics of Corners Formed by Si{111} Planes on Si{110} Wafer Surface

Engineering

doi 10.4236/eng.2013.511a001

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Date

January 1, 2013

Authors

Prem Pal

Sajal Sagar Singh

Publisher

Scientific Research Publishing, Inc.

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A New Model for the Etching Characteristics of Corners Formed by Si<sub>{111}</Sub> Planes on Si<sub>{110}</Sub> Wafer Surface

Engineering

doi 10.4236/eng.2013.511a001

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