Real-Time, in Situ Film Thickness Metrology in a 10 Torr W Chemical Vapor Deposition Process Using an Acoustic Sensor

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures

doi 10.1116/1.1565342

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Abstract

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Date

January 1, 2003

Authors

L. Henn-Lecordier

Publisher

American Vacuum Society

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