Thermal Donors Formation via Isothermal Annealing in Magnetic Czochralski High Resistivity Silicon

Journal of Applied Physics - United States
doi 10.1063/1.2192307
Full Text
Abstract

Available in full text

Date
Authors
Publisher

AIP Publishing

Related search

Formation Kinetics of Thermal Donors in Silicon

Materials Research Society Symposium - Proceedings
Mechanics of MaterialsMaterials ScienceCondensed Matter PhysicsMechanical Engineering
1985English

Hardening of an Al0.3CoCrFeNi High Entropy Alloy via High-Pressure Torsion and Thermal Annealing

Materials Letters
Mechanics of MaterialsMaterials ScienceCondensed Matter PhysicsMechanical Engineering
2015English

Numerical Simulation of Thermal History for Czochralski Growth of Silicon Single Crystals.

Nihon Kikai Gakkai Ronbunshu, B Hen/Transactions of the Japan Society of Mechanical Engineers, Part B
Condensed Matter PhysicsMechanical Engineering
1992English

Effect of Germanium Doping on the Annealing Characteristics of Oxygen and Carbon-Related Defects in Czochralski Silicon

Journal of Applied Physics
AstronomyPhysics
2010English

The Change in Static Magnetic Properties With Isothermal Annealing in Amorphous Ferromagnetic Alloys

Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals
Mechanics of MaterialsAlloysMaterials ChemistryCondensed Matter PhysicsMetals
1979English

Grain Growth and Texture Formation by Annealing of Rapidly Quenched High Silicon-Iron Alloy

Transactions of the Japan Institute of Metals
1984English

Hall Effect Analysis on Neutron Irradiated High Resistivity Silicon

Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment
High Energy PhysicsInstrumentationNuclear
1995English

Effect of Isothermal Magnetic Annealing on the Magnetic Properties of Fe-Co Alloys at Room Temperature

Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals
Mechanics of MaterialsAlloysMaterials ChemistryCondensed Matter PhysicsMetals
1959English

Surface Self-Diffusion of Silicon During High Temperature Annealing

Journal of Applied Physics
AstronomyPhysics
2014English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2024 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy