Near-Infrared Reflective Characteristics of Aluminum-Doped ZnO Thin Films Fabricated by Off-Axis Sputtering

Journal of the Ceramic Society of Japan- Japan

doi 10.2109/jcersj2.18162

Full Text

Abstract

Available in

Date

Authors

Publisher

Ceramic Society of Japan

Related search

Near-Infrared Photoactive Cu2ZnSnS4 Thin Films by Co-Sputtering

AIP Advances
NanotechnologyAstronomyPhysicsNanoscience
2013English

Structural Analysis of Ferromagnetic Mn-Doped ZnO Thin Films Deposited by Radio Frequency Magnetron Sputtering

Journal of Applied Physics
AstronomyPhysics
2005English

ZnO Thin Films Prepared by Ion Beam Sputtering Deposition.

SHINKU
1987English

Photocatalytic Tio Thin Films Fabricated by Dc Reactive Magnetron Sputtering

Science and Technology Development Journal
2009English

Photocatalytic Tio Thin Films Fabricated by Dc Reactive Magnetron Sputtering

Science and Technology Development Journal
2009English

Bi-Stable Resistive Switching Characteristics in Ti-Doped ZnO Thin Films

Nanoscale Research Letters
Materials ScienceNanotechnologyCondensed Matter PhysicsNanoscience
2013English

Structure, Optical and Electrical Properties of Nb Doped ZnO Transparent Conductive Thin Films Prepared by Co-Sputtering Method

Journal of Advanced Dielectrics
Electronic EngineeringCondensed Matter PhysicsOpticalElectricalMagnetic MaterialsCompositesElectronicCeramics
2019English

Cu Doped TiO2 Thin Films Fabricated by Simple SPD Technique

IOSR Journal of Applied Physics
2017English

Transparent Conductive Nd-Doped ZnO Thin Films

Journal of Physics D: Applied Physics
SurfacesUltrasonicsCondensed Matter PhysicsAcousticsOpticalMagnetic MaterialsFilmsCoatingsElectronic
2015English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2026 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy