Germanium Thin Film Formation by Low-Pressure Chemical Vapor Deposition

Journal of the Electrochemical Society - United States
doi 10.1149/1.1837605
Full Text
Abstract

Available in full text

Date
Authors
Publisher

The Electrochemical Society

Related search

Low-Temperature, Low-Pressure Chemical Vapor Deposition and Solid Phase Crystallization of Silicon–Germanium Films

Journal of the Electrochemical Society
SurfacesCondensed Matter PhysicsOpticalElectrochemistrySustainabilityMaterials ChemistryMagnetic MaterialsRenewable EnergyFilmsCoatingsElectronicthe Environment
2009English

Particle Formation During Low-Pressure Chemical Vapor Deposition From Silane and Oxygen: Measurement, Modeling, and Film Properties

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
SurfacesFilmsInterfacesCondensed Matter PhysicsCoatings
2002English

Deposition and Properties of Zn3N2 Thin Films by Atmospheric Pressure Chemical Vapor Deposition

Transactions of the Materials Research Society of Japan
2008English

Low Temperature Fabrication of Thermochromic VO2thin Films by Low-Pressure Chemical Vapor Deposition

RSC Advances
ChemistryChemical Engineering
2017English

Mechanical Properties of B(C,N) Thin Film by Plasma-Assisted Chemical Vapor Deposition.

SHINKU
1998English

Causes of Anomalous Solid Formation in the Exhaust Systems of Low-Pressure Chemical Vapor Deposition and Plasma Enhanced Chemical Vapor Deposition Semiconductor Processes

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
1994English

Low-Pressure Chemical Vapor Deposition of LiCoO[sub 2] Thin Films: A Systematic Investigation of the Deposition Parameters

Journal of the Electrochemical Society
SurfacesCondensed Matter PhysicsOpticalElectrochemistrySustainabilityMaterials ChemistryMagnetic MaterialsRenewable EnergyFilmsCoatingsElectronicthe Environment
2009English

Thermal Expansion of Low-Pressure Chemical Vapor Deposition Polysilicon Films

Journal of Materials Research
Mechanics of MaterialsMaterials ScienceCondensed Matter PhysicsMechanical Engineering
2002English

Low Pressure Chemical Vapor Deposition of A-Si:H From Disilane

English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2024 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy