Low Temperature Deposition of SiNx Thin Films by the LPCVD Method

Croatica Chemica Acta - Croatia
doi 10.5562/cca1970
Full Text
Abstract

Available in full text

Categories
Chemistry
Date
Authors
Publisher

Croatian Chemical Society

Related search

Deposition of SiNx Thin Films by Atmospheric Pressure Glow Discharge Plasmas.

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
1994English

Low-Temperature Growth of Yttria-Stabilized Zirconia Thin Films by Pulsed Laser Deposition

Transactions of the Materials Research Society of Japan
2009English

Bipolar Resistive Switching Characteristics of Low Temperature Grown ZnO Thin Films by Plasma-Enhanced Atomic Layer Deposition

Applied Physics Letters
AstronomyPhysics
2013English

Low Temperature Fabrication of Thermochromic VO2thin Films by Low-Pressure Chemical Vapor Deposition

RSC Advances
ChemistryChemical Engineering
2017English

Visible Photoluminescence in Amorphous SiNx Thin Films Prepared by Reactive Evaporation

Applied Physics Letters
AstronomyPhysics
2000English

Characterization of SiNx Film by Room Temperature Low Frequency (50Hz) Plasma CVD.

SHINKU
1987English

Deposition of Dense Nanocrystalline Sm0.2Ce0.8O1.9 Thin Films by Pulsed Laser Deposition

ECS Meeting Abstracts
2005English

Nanostructure Formation During Deposition of TiN∕SiNx Nanomultilayer Films by Reactive Dual Magnetron Sputtering

Journal of Applied Physics
AstronomyPhysics
2005English

Optical Properties of Lead Doped Titanium Oxide of Thin Films Prepared by Sol-Gel Method at Low Temperature

Universal Journal of Materials Science
2019English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2024 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy