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Experimental Study on Ig RTS Noise of SiON/HfO2/TaN PMOSFETs
doi 10.7567/ssdm.2009.a-2-6
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Date
October 7, 2009
Authors
L. Zhang
R. Wang
J. Zhuge
R. Huang
T. Yu
P. Kirsch
H. H. Tseng
Y. Wang
Publisher
The Japan Society of Applied Physics
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