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Mathematical Analysis of Soft Baking in Photolithography

Journal of Applied Physics - United States
doi 10.1063/1.1335823
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Abstract

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Categories
AstronomyPhysics
Date

January 1, 2001

Authors
Jyh-Ping HsuSung-Hwa LinWen-Chang ChenShiojenn Tseng
Publisher

AIP Publishing


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