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Fabrication of a Patterned Ferromagnetic Thin Film With an Si3N4 Membrane Mask.
Journal of the Magnetics Society of Japan
doi 10.3379/jmsjmag.25.91
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Date
January 1, 2001
Authors
M. Kimura
Y. Yamada
R. Nakane
M. Nakamura
K. Sueoka
K. Mukasa
Publisher
The Magnetics Society of Japan
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