Design of a Hyper-Numerical-Aperture Deep Ultraviolet Lithography Objective With Freeform Surfaces

Chinese Optics Letters - China
doi 10.3788/col201816.030801
Full Text
Abstract

Available in full text

Date
Authors
Publisher

Shanghai Institute of Optics and Fine Mechanics

Related search

Ptychography as a Wavefront Sensor for High-Numerical Aperture Extreme Ultraviolet Lithography: Analysis and Limitations

Optical Engineering
EngineeringOpticsAtomicMolecular Physics,
2019English

Approaching the Numerical Aperture of Water Immersion Lithography at 193-Nm

2004English

A General Multi-Objective Hyper-Heuristic for Water Distribution Network Design With Discolouration Risk

Journal of Hydroinformatics
Geotechnical EngineeringCivilEngineering GeologyAtmospheric ScienceStructural EngineeringWater ScienceTechnology
2012English

Hyper High Numerical Aperature Achromatic Interferometer for Immersion Lithography at 193 Nm

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2005English

Design of Optical Elements With TIR Freeform Surface

Computer Optics
Electronic EngineeringPattern RecognitionEngineeringMolecular Physics,Computer VisionComputer Science ApplicationsElectricalAtomicOptics
2016English

On Dynamic Analysis of Contact Problems With Freeform Surfaces: A Knee Joint 3d-Study

Journal of Biomechanics
Sports MedicineSports ScienceBiophysicsOrthopedicsBiomedical EngineeringRehabilitation
2012English

Guest Editorial: Extreme Ultraviolet Interference Lithography

Journal of Micro/ Nanolithography, MEMS, and MOEMS
Electronic EngineeringCondensed Matter PhysicsMechanical EngineeringElectronicMolecular Physics,NanoscienceOpticalElectricalAtomicMagnetic MaterialsNanotechnologyOptics
2009English

Fiducial-Aided Robust Positioning of Optical Freeform Surfaces

Micromachines
ControlSystems EngineeringElectricalMechanical EngineeringElectronic Engineering
2018English

Evaluation of Optical Characteristics in Deep Ultraviolet Region. Measurement of Optical Elements Used for Excimer Laser Lithography.

Journal of the Spectroscopical Society of Japan
2000English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2024 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy