Wafer Topography-Aware Optical Proximity Correction for Better DOF Margin and CD Control

doi 10.1117/12.620379
Full Text
Abstract

Available in full text

Date
Authors
Publisher

SPIE

Amanote Research

Note-taking for researchers

Follow Amanote

© 2026 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy