Molecular Design of PAC Used for the Positive Photoresists: Optimization of M/a Value Before and After Photolysis.

Journal of Photopolymer Science and Technology- Japan

doi 10.2494/photopolymer.11.89

Full Text

Abstract

Available in

Categories

Organic Chemistry

Materials Chemistry

Date

January 1, 1998

Authors

Publisher

Technical Association of Photopolymers, Japan

Related search

Photolysis of Polyamides Containing Thymine Photodimer Units in the Main Chain and Application to Deep-Uv Positive Type Photoresists

Polymer Journal

Materials Chemistry

English

Net-Zero and Net-Positive Design: A Question of Value

Building Research and Information

Structural Engineering

English

Photoresists for Microlithography Chemical Amplification in Resist Design

Journal of the Japan Society of Colour Material

English

Analysis of Antibiotics on Patients Surgery, Before and After Used Guidelines for Antibiotics (PPAB)

Jurnal Pharmascience

English

Existence of Positive Solutions for Second Order M-Point Boundary Value Problems

Annales Polonici Mathematici

English

Quality Improvement Studies - Pitfalls of the Before and After Study Design

English

Effects of Airborne Molecular Contamination on DUV Photoresists.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

A Before–after Analysis for the Design Problem on an Urban Road Network

English

Evaluating Value‐at‐risk Models Before and After the Financial Crisis of 2008

Managerial Finance

English