Chemical Deposition of Silica-Based Thin Films Under Supercritical Carbon Dioxide Atmosphere Using Tetraethylorthosilicate Precursor With Oxidizing Agents

Journal of the Ceramic Society of Japan - Japan
doi 10.2109/jcersj2.15202
Full Text
Abstract

Available in full text

Date
Authors
Publisher

Ceramic Society of Japan

Related search

Investigation of Chemical Bath Deposition of ZnO Thin Films Using Six Different Complexing Agents

Journal of Physics D: Applied Physics
SurfacesUltrasonicsCondensed Matter PhysicsAcousticsOpticalMagnetic MaterialsFilmsCoatingsElectronic
2009English

Aerosol Assisted Chemical Vapour Deposition of Hydroxyapatite-Embedded Titanium Dioxide Composite Thin Films

Journal of Photochemistry and Photobiology A: Chemistry
ChemistryPhysicsChemical EngineeringAstronomy
2017English

Carbon Dioxide Adsorption Using Activated Carbon via Chemical Vapor Deposition Process

Engineering Journal
Engineering
2016English

Effect of Solute Adsorption Properties on Its Separation From Supercritical Carbon Dioxide With a Thin Porous Silica Membrane

Bioscience, Biotechnology and Biochemistry
Organic ChemistryApplied MicrobiologyMolecular BiologyBiochemistryAnalytical ChemistryMedicineBiotechnology
1996English

Chemical Bath Deposition of In2S3 Thin Films

European Reviews of Chemical Research
2015English

Preparation of Activated-Carbon-Supported Platinum Nanoparticles Using Supercritical Fluid Chemical Deposition

Journal of The Surface Finishing Society of Japan
2012English

Fabrication of Thin Palladium Membrane by Electroplating Coexisting With Supercritical Carbon Dioxide

MEMBRANE
2006English

Supercritical Carbon Dioxide

2005English

Thin Films Under Chemical Stress

1991English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2024 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy