Amanote Research

Amanote Research

    RegisterSign In

Dynamic Feature Monitoring Technique Applied to Thin Film Deposition Processes in an Industrial PECVD Tool

doi 10.1115/msec2011-50041
Full Text
Open PDF
Abstract

Available in full text

Date

January 1, 2011

Authors
Alexander BleakieDragan Djurdjanovic
Publisher

ASMEDC


Related search

Thin Film Preparation Using Pulsed Laser Deposition Technique

The Review of Laser Engineering
2000English

Deposition and Properties of Thin PECVD Carbon Films After Rapid Thermal Annealing

Le Journal de Physique IV
1995English

LiNi0.4Co0.3Mn0.3O2 Thin Film Electrode by Aerosol Deposition

Nanoscale Research Letters
Materials ScienceNanotechnologyCondensed Matter PhysicsNanoscience
2012English

Thin Organic Film Fabrication Technique. Langmuir-Blodgett Technique.

Hyomen Kagaku
1986English

Piezoelectric Thin Film Deposition: Novel Self-Assembled Island Structures and Low Temperature Processes on Silicon

2010English

Similarities Between Rainmaking Processes and Thin Film Growth Processes.

Hyomen Kagaku
1998English

Growth of GaN Thin Film on Amorphous Glass Substrate by Direct-Current Pulse Sputtering Deposition Technique

Coatings
SurfacesFilmsCoatingsMaterials ChemistryInterfaces
2019English

Vanadium Oxide Thin Film by Aqueous Spray Deposition

MRS Advances
2018English

How to Use the Monte Carlo Simulation Technique? Application: A Study of the Gas Phase During Thin Film Deposition

2019English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2025 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy