Effects of Annealing Condition on Low-K A-SiOC:H Thin Films

Electrochemical and Solid-State Letters
doi 10.1149/1.2432944
Full Text
Abstract

Available in full text

Date
Authors
Publisher

The Electrochemical Society

Related search

Constraint Effects on Cohesive Failures in Low-K Dielectric Thin Films

Materials Research Society Symposium - Proceedings
Mechanics of MaterialsMaterials ScienceCondensed Matter PhysicsMechanical Engineering
2005English

Nanoindentation of Silicate Low-K Dielectric Thin Films

Materials Research Society Symposium - Proceedings
Mechanics of MaterialsMaterials ScienceCondensed Matter PhysicsMechanical Engineering
2002English

Annealing Effects on V2o5-X Thin Films Deposited by Non Reactive Sputtering

Nanosystems: Physics, Chemistry, Mathematics
2016English

Annealing Effects on the Properties of Copper Selenide Thin Films for Thermoelectric Applications

IOSR Journal of Applied Physics
2013English

Laser Annealing of Thin Semiconductor Films

1993English

Pulsed Laser Annealing of Thin Silicon Films

Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
EngineeringAstronomyPhysics
2006English

Annealing Effects of ZnO Thin Films on P-Si(100) Substrate Deposited \Newline by PFCVAD

Turkish Journal of Physics
AstronomyPhysics
2014English

Annealing-Induced Effects on Structural and Optical Properties of Cd1−xZnxS Thin Films for Optoelectronic Applications

Materials Science-Poland
Mechanics of MaterialsMaterials ScienceCondensed Matter PhysicsMechanical Engineering
2015English

Annealing Studies of Magnetron-Sputtered CoCr Thin Films

Physica B: Condensed Matter
Electronic EngineeringCondensed Matter PhysicsOpticalElectricalMagnetic MaterialsElectronic
1993English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2024 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy