Erratum: “Two-Step Cycling Process Alternating Implantation and Remote Plasma Etching for Topographically Selective Etching: Application to Si3N4 Spacer Etching” [J. Appl. Phys. 126, 243301 (2019)]
Journal of Applied Physics - United States
doi 10.1063/5.0008898
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Date
April 30, 2020
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AIP Publishing