Experimental and Computational Studies of Phase Shift Lithography With Binary Elastomeric Masks

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
doi 10.1116/1.2184321
Full Text
Abstract

Available in full text

Date
Authors
Publisher

American Vacuum Society

Related search

Infrared Frequency Selective Surfaces Fabricated Using Optical Lithography and Phase-Shift Masks

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2001English

Phase-Shift Mask Issues for 193-Nm Lithography

1994English

Experimental and Computational Studies of Hydrodynamics in Three-Phase and Two-Phase Fluidized Beds

1994English

Digital Binary Phase-Shift Keyed Signal Detector

International Journal of Engineering, Transactions A: Basics
Engineering
2019English

Polarization Gradient Light Masks in Atom Lithography

Europhysics Letters
AstronomyPhysics
1999English

Continuous Phase-Shift Lithography With a Roll-Type Mask and Application to Transparent Conductor Fabrication

Nanotechnology
Mechanics of MaterialsElectronic EngineeringMechanical EngineeringMaterials ScienceNanoscienceElectricalBioengineeringNanotechnologyChemistry
2012English

Performance Limits of Binary Annular Phase Masks Codesigned for Depth-Of-Field Extension

Optical Engineering
EngineeringOpticsAtomicMolecular Physics,
2017English

Experimental and Computational Studies of Obscurin's Flexibility

Biophysical Journal
Biophysics
2018English

Experimental and Computational Studies of Polar Solvation

1991English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2024 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy