Methods for the Synthesis and Purification of Polycycloalkane Candidates for Photolithography Immersion Fluids at 193nm: Requirements for Removal of Oxygen
Journal of Micro/ Nanolithography, MEMS, and MOEMS - United States
doi 10.1117/1.2778641
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July 1, 2007
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SPIE-Intl Soc Optical Eng