Diffusion of Sr, Bi, and Ta in Amorphous SiO2
Materials Science in Semiconductor Processing - United Kingdom
doi 10.1016/s1369-8001(03)00070-2
Full Text
Open PDFAbstract
Available in full text
Date
February 1, 2003
Authors
Publisher
Elsevier BV
Available in full text
February 1, 2003
Elsevier BV