Pulsed Bias Effect on Crystallinity and Nano-Roughness of Ti6Al4V-N Films Deposited by Grid Assisted Magnetron Sputtering System
Materials Research - Brazil
doi 10.1590/1516-1439.271314
Full Text
Open PDFAbstract
Available in full text
Date
December 1, 2014
Authors
Publisher
FapUNIFESP (SciELO)