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Techno(Stress) and Techno(Distress): Validation of a Specific TechnoStressors Index (TSI) Among Quebec Lawyers

doi 10.24251/hicss.2020.747
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Abstract

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Date

January 1, 2020

Authors
Nathalie CadieuxJean CadieuxNancy YoussefElaine Mosconi
Publisher

Hawaii International Conference on System Sciences


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