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Two-Step Ni Silicide Process and Influence of Protective N2gas

Journal of Semiconductors - United Kingdom
doi 10.1088/1674-4926/30/9/096002
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Abstract

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Categories
Electronic EngineeringCondensed Matter PhysicsMaterials ChemistryOpticalElectricalMagnetic MaterialsElectronic
Date

September 1, 2009

Authors
Shang HaipingXu Qiuxia
Publisher

IOP Publishing


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