Amanote Research
Register
Sign In
Physical and Electrical Properties of MOCVD and ALD Deposited HfZrO
doi 10.1149/1.3481586
Full Text
Open PDF
Abstract
Available in
full text
Date
January 1, 2010
Authors
Torben Kelwing
Sergej Mutas
Martin Trentzsch
Andreas Naumann
Bernhard Trui
Lutz Herrmann
Falk Graetsch
Christoph Klein
Lutz Wilde
Susanne Ohsiek
Martin Weisheit
Anita Peeva
Inka Richter
Hartmut Prinz
Alexander Wuerfel
Rick Carter
Rolf Stephan
Peter Kücher
Walter Hansch
Publisher
ECS
Related search
Electrical Properties of Vacuum-Deposited GaAs Films
IEEJ Transactions on Fundamentals and Materials
Electronic Engineering
Electrical
Study on the Electrical Properties of NiZnO Films Grown by MOCVD
DEStech Transactions on Materials Science and Engineering
Structural and Electrical Properties of Titanium-Nickel Films Deposited Onto Silicon Substrates
Materials Research Society Symposium - Proceedings
Mechanics of Materials
Materials Science
Condensed Matter Physics
Mechanical Engineering
Structural Characterization of (Re)Bco Layer Deposited by PLD and Mocvd Techniques
Research Papers Faculty of Materials Science and Technology Slovak University of Technology
Structure and Some Physical Properties of Chemically Deposited Nickel Sulfide Thin Films
Acta Physica Polonica A
Astronomy
Physics
Physical and Electrical Characteristics of F- And C-Doped Low Dielectric Constant Chemical Vapor Deposited Oxides
Journal of the Electrochemical Society
Surfaces
Condensed Matter Physics
Optical
Electrochemistry
Sustainability
Materials Chemistry
Magnetic Materials
Renewable Energy
Films
Coatings
Electronic
the Environment
Optical, Electrical and Structural Properties of Zinc SelenideSemiconductor Nano Films Deposited by Electrodeposition Technique.
IOSR Journal of Applied Physics
Physical and Wear Properties of Laser Melting Deposited Composites on a TA1 Alloy
Kovove Materialy
Mechanics of Materials
Alloys
Materials Chemistry
Metals
Mechanical Engineering
ALD Resist Formed by Vapor-Deposited Self-Assembled Monolayers
