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Simulation of Anisotropic Wet-Chemical Etching Using a Physical Model
doi 10.1109/memsys.1999.746850
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Date
January 1, 1999
Authors
J. van Suchtelen
K. Sato
E. van Veenendaal
A.J. Nijdam
J.G.E. Gardeniers
W.J.P. van Enckevort
M. Elwenspoek
Publisher
IEEE
