Effect of Annealing on A-Si:H Thin Films Fabricated by RF Magnetron Sputtering

Korean Journal of Materials Research - South Korea
doi 10.3740/mrsk.2009.19.2.102
Full Text
Abstract

Available in full text

Date
Authors
Publisher

The Materials Research Society of Korea

Related search

The Effect of Post Annealing on Physical Properties of NiTe2 Thin Film Fabricated by Magnetron Sputtering

Journal of Korean Institute of Metals and Materials
SurfacesAlloysMetalsSimulationOpticalMagnetic MaterialsFilmsModelingCoatingsElectronic
2020English

Photocatalytic Tio Thin Films Fabricated by Dc Reactive Magnetron Sputtering

Science and Technology Development Journal
2009English

Photocatalytic Tio Thin Films Fabricated by Dc Reactive Magnetron Sputtering

Science and Technology Development Journal
2009English

Thermoelectric Properties of Zn0.98Al0.02O Thin Films Prepared by RF Magnetron Sputtering

Journal of the Ceramic Society of Japan
Materials ChemistryChemistryCondensed Matter PhysicsCompositesCeramics
2004English

Structure of Indium Nitride Thin Films Prepared by RF-magnetron Sputtering

Acta Crystallographica Section A Foundations of Crystallography
1996English

Vanadium Oxide Thin Films Obtained by Thermal Annealing of Layers Deposited by RF Magnetron Sputtering at Room Temperature

2017English

Hydrogen Influence on Gallium Arsenide Thin Films Prepared by Rf-Magnetron Sputtering Technique

Brazilian Journal of Physics
AstronomyPhysics
2006English

Study of Thermal Annealing Effect on the Properties of Silver Thin Films Prepared by DC Magnetron Sputtering

Acta Physica Polonica A
AstronomyPhysics
2016English

Calcium Phosphate Films With/Without Heat Treatments Fabricated Using RF Magnetron Sputtering

Journal of Biomechanical Science and Engineering
Biomedical Engineering
2009English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2024 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy