Role of Static Inductance on Ion Beam Emission in Plasma Focus Devices

Journal of Plasma Physics - United Kingdom
doi 10.1017/s0022377812000438
Full Text
Abstract

Available in full text

Date
Authors
Publisher

Cambridge University Press (CUP)

Related search

Ion Beam Trimming in Manufacturing of Acoustic Wave Devices

Nanoindustry Russia
2015English

Wafer-Scale Ion Beam Lithography of Nanopore Devices

Microscopy and Microanalysis
Instrumentation
2013English

Modeling iSE Emission for Ion Beam Imaging

Microscopy and Microanalysis
Instrumentation
2013English

On the Role of Ion-Based Imaging Methods in Modern Ion Beam Therapy

2014English

Ion-Beam Focusing in a Double-Plasma Device

IEEE Transactions on Plasma Science
High Energy PhysicsNuclearCondensed Matter Physics
1988English

Effect of Ion Beam on Electromagnetic Ion Cyclotron Instability in Hot Anisotropic Plasma-Particle Aspect Analysis

Annales Geophysicae
Planetary SciencesGeologySpaceAtmospheric SciencePlanetary ScienceAstrophysicsEarthAstronomy
2011English

ZnO-Based Microcavities Sculpted by Focus Ion Beam Milling

Nanoscale Research Letters
Materials ScienceNanotechnologyCondensed Matter PhysicsNanoscience
2016English

Study of Plasma and Ion Beam Sputtering Processes

Journal of Physical Science and Application
2015English

Research on Pinch Plasma Focus Devices of Hundred of Kilojoules to Tens of Joules

Brazilian Journal of Physics
AstronomyPhysics
2004English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2025 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy