Process and Resist Parameters Influencing the MEEF Values for Sub-90nm Cntact Hole Patterns

Journal of Photopolymer Science and Technology - Japan
doi 10.2494/photopolymer.21.363
Full Text
Abstract

Available in full text

Date
Authors
Publisher

Technical Association of Photopolymers, Japan

Related search

The Optimization of Machining Process Parameters for Factors Influencing KDP Crystal Surface Quality

2016English

193 Nm Resist Line Collapse Study by Modifying the Resist Polymer and Process Conditions With Utilizing FIRM Process

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2004English

Mobility Modulation Technology Impact on Device Performance and Reliability for Sub-90nm SOI CMOSFETs

2005English

In Situ Analysis of the EUV Resist Pattern Formation During the Resist Dissolution Process

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2013English

Identification of the Influencing Parameters for the Synthesis of the Process Control System for Extractor of Aromatic Hydrocarbons

Applied Mathematics and Fundamental Informatics
2018English

Chemically Amplified Si-Contained Resist Using Silsesquoxane for ArF Lithography (CASUAL) and Its Application to Bi-Layer Resist Process.

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
1997English

SiNxCoatings Deposited by Reactive High Power Impulse Magnetron Sputtering: Process Parameters Influencing the Nitrogen Content

ACS Applied Materials & Interfaces
MedicineMaterials ScienceNanotechnologyNanoscience
2016English

Reference Values for Hematological and Serum Biochemical Parameters of Dromedary Camel (Camelus Dromedarius) in Sub-Tropical Climate of Bangladesh

Advances in Animal and Veterinary Sciences
Animal ScienceZoologyVeterinary
2019English

Recent Strategy of Biodiesel Production From Waste Cooking Oil and Process Influencing Parameters: A Review

Journal of Energy
2013English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2024 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy