Diamine Adduct of Cobalt(II) Chloride as a Precursor for Atomic Layer Deposition of Stoichiometric Cobalt(II) Oxide and Reduction Thereof to Cobalt Metal Thin Films
Chemistry of Materials - United States
doi 10.1021/acs.chemmater.8b01271
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Date
May 7, 2018
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American Chemical Society (ACS)