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Lithographic Characteristics of Alicyclic Polymer Based ArF Single Layer Resists.

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
1994English

Study of PAG Size Effect on Lithographic Performance of 157nm Resists.

Journal of Photopolymer Science and Technology
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2002English

Lithographic Metrics for the Determination of Intrinsic Resolution Limits in EUV Resists

2007English

T-Boc Based Resists: A Polymeric Platform for .LEQ.0.25.MU.m Lithographic Technologies.

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
1993English

Large Supramolecular Assemblies Ofp-Sulfonatocalix[4]arene

Acta Crystallographica Section A Foundations of Crystallography
2007English

Doubly Spin-Labeled RNA as an EPR Reporter for Studying Multicomponent Supramolecular Assemblies

Biophysical Journal
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Correlation of Lithographic Performance of the Electron Beam Resists SML and ZEP With Their Chemical Structure

Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
SurfacesElectronic EngineeringCondensed Matter PhysicsInstrumentationElectronicOpticalMaterials ChemistryElectricalMagnetic MaterialsFilmsProcess ChemistryCoatingsTechnology
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Accurate Length Control of Supramolecular Oligomerization: Vernier Assemblies

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Coordination-Driven Syntheses of Compact Supramolecular Metallacycles Toward Extended Metallo-Organic Stacked Supramolecular Assemblies

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