Adhesion Enhancement of Norbornene Polymers With Lithocholate Substituents for 193-Nm Resists

Polymer Journal - United Kingdom
doi 10.1295/polymj.36.18
Full Text
Abstract

Available in full text

Date
Authors
Publisher

Springer Science and Business Media LLC

Related search

PAG Incorporated Polymeric Resists for Sub-100 Nm Patterning at 193 Nm Exposure

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2006English

Photodissociation of Isobutene at 193 Nm

Physical Chemistry Chemical Physics
Theoretical ChemistryAstronomyPhysicsPhysical
2012English

Laser Ablation of Nanoscale Particles With 193 Nm Light

Journal of Physics: Conference Series
AstronomyPhysics
2007English

Integration of Directed Self-Assembly With 193 Nm Lithography

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2010English

Phase-Shift Mask Issues for 193-Nm Lithography

1994English

A Resolution Enhancement Material for 193-Nm Lithography Comprising 2-Hydroxybenzyl Alcohol and Poly(vinyl Alcohol) With Uniform Resist Pattern Shrinkage

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2011English

Photodissociation Dynamics of Benzyl Alcohol at 193 Nm

Journal of Chemical Physics
MedicineTheoretical ChemistryAstronomyPhysicsPhysical
2012English

Photochemical Interaction of Polystyrene Nanospheres With 193 Nm Pulsed Laser Light

Journal of Physical Chemistry B
SurfacesTheoretical ChemistryMaterials ChemistryFilmsMedicineCoatingsPhysical
2005English

Roughness and Light Scattering of Ion-Beam-Sputtered Fluoride Coatings for 193 Nm

Applied Optics
2000English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2024 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy