Fullerene Grafted Photoacid Generator (PAG) Bound Polymer Resists

Journal of Photopolymer Science and Technology- Japan

doi 10.2494/photopolymer.21.747

Full Text

Abstract

Available in

Date

Authors

Publisher

Technical Association of Photopolymers, Japan

Related search

Terpolymers of Tosyloxymaleimide for Application as a Polymeric Photoacid Generator in Single-Component Resists.

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
1994English

Study of PAG Size Effect on Lithographic Performance of 157nm Resists.

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2002English

PAG Incorporated Polymeric Resists for Sub-100 Nm Patterning at 193 Nm Exposure

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2006English

Grafted Polymer Chains Suppress Nanoparticle Diffusion in Athermal Polymer Melts

Journal of Chemical Physics
MedicineTheoretical ChemistryAstronomyPhysicsPhysical
2017English

Metal Evaporation-Induced Degradation of Fullerene Acceptors in Polymer/Fullerene Solar Cells

English

Reversibly Cross-Linked Surface-Grafted Polymer Brushes

Angewandte Chemie
2006English

Lithographic Characteristics of Alicyclic Polymer Based ArF Single Layer Resists.

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
1994English

Engineering and Applications of DNA-grafted Polymer Materials

Chemical Science
Chemistry
2013English

Collective Ordering of Colloids in Grafted Polymer Layers

Soft Matter
ChemistryCondensed Matter Physics
2013English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2026 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy