Island Coalescence During Film Growth: An Underestimated Limitation of Cu ALD

Advanced Materials Interfaces - United Kingdom
doi 10.1002/admi.201700274
Full Text
Abstract

Available in full text

Date
Authors
Publisher

Wiley

Related search

Suspended and Bilayer Graphene Growth at Cu Grain Boundaries on Thin Film Cu

Microscopy and Microanalysis
Instrumentation
2016English

Agglomeration and Dendritic Growth of Cu/Ti/Si Thin Film

Journal of Nanomaterials
Materials ScienceNanotechnologyNanoscience
2014English

Nitrogen Limitation of Phytoplankton Growth in an Oligotrophic Lake

English

Computer Modeling of Y-Ba-Cu-O Thin Film Deposition and Growth

1992English

Fatigue Crack Growth and Coalescence Study.

English

Competition Between Crystallization and Coalescence During the Film Formation of Poly(Chloroprene) Latex and Effects on Mechanical Properties

English

Pazopanib-Induced Alopecia, an Underestimated Toxicity?

Frontiers in Oncology
Cancer ResearchOncology
2015English

Epitaxial Growth and Electronic Properties of Large Hexagonal Graphene Domains on Cu(111) Thin Film

2013English

Growth of Β Intermetallic in an Al-Cu-Si Alloy During Directional Solidification via Machine Learned 4D Quantification

Scripta Materialia
Mechanics of MaterialsMaterials ScienceAlloysCondensed Matter PhysicsMechanical EngineeringMetalsNanoscienceNanotechnology
2019English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2025 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy