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Characterizations of Nickel Oxide Thin Films Prepared by Reactive Radio Frequency Magnetron Sputtering
doi 10.2991/icadme-15.2015.160
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Date
January 1, 2015
Authors
Z.H. Xiao
X.F. Xia
S.J. Xu
Y.P. Luo
W. Zhong
H. Ou
E.S. Jiang
Publisher
Atlantis Press
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