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Surface Hydrogen Incorporation and Profile Broadening Caused by Sheath Expansion in Hydrogen Plasma Immersion Ion Implantation
IEEE Transactions on Plasma Science
- United States
doi 10.1109/27.848095
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Categories
High Energy Physics
Nuclear
Condensed Matter Physics
Date
April 1, 2000
Authors
P.K. Chu
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
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