Photocatalytic and Photoelectrochemical Performance of Ta3N5 Microcolumn Films Fabricated Using Facile Reactive Sputtering

Journal of Applied Physics - United States
doi 10.1063/1.4960806
Full Text
Abstract

Available in full text

Date
Authors
Publisher

AIP Publishing

Related search

Photocatalytic Tio Thin Films Fabricated by Dc Reactive Magnetron Sputtering

Science and Technology Development Journal
2009English

Photocatalytic Tio Thin Films Fabricated by Dc Reactive Magnetron Sputtering

Science and Technology Development Journal
2009English

Photocatalytic Properties of Doped TiO2 Coatings Deposited Using Reactive Magnetron Sputtering

Coatings
SurfacesFilmsCoatingsMaterials ChemistryInterfaces
2017English

Calcium Phosphate Films With/Without Heat Treatments Fabricated Using RF Magnetron Sputtering

Journal of Biomechanical Science and Engineering
Biomedical Engineering
2009English

Facile Fabrication of BiOI/BiOCl Immobilized Films With Improved Visible Light Photocatalytic Performance

Frontiers in Chemistry
Chemistry
2018English

Facile Growth of Porous Hematite Films for Photoelectrochemical Water Splitting

International Journal of Photoenergy
Materials ScienceRenewable EnergyMolecular Physics,SustainabilityAtomicChemistryOpticsthe Environment
2013English

Preparation of Hard CNx Films by Reactive Sputtering.

SHINKU
2001English

HfSiON Films Deposited by Radio Frequency Reactive Sputtering

2013English

Preparation of N-Doped TiOx Films as Photocatalyst Using Reactive Sputtering With Dry Air

Materials Transactions
Mechanics of MaterialsMaterials ScienceCondensed Matter PhysicsMechanical Engineering
2009English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2024 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy