Quantitative Characterization of Absorber and Phase Defects on EUV Reticles Using Coherent Diffraction Imaging
Journal of Micro/ Nanolithography, MEMS, and MOEMS - United States
doi 10.1117/1.jmm.19.1.014002
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January 30, 2020
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SPIE-Intl Soc Optical Eng