Fabrication of Imprint Mold With Nanotrench Patterns by Edge Lithography

Journal of Photopolymer Science and Technology - Japan
doi 10.2494/photopolymer.27.91
Full Text
Abstract

Available in full text

Date
Authors
Publisher

Technical Association of Photopolymers, Japan

Related search

Nanoscale Patterning of Magnetic Islands by Imprint Lithography Using a Flexible Mold

Applied Physics Letters
AstronomyPhysics
2002English

Fine Pattern Fabrication on a Polymer Plate by Direct Imprint Lithography

IEEJ Transactions on Sensors and Micromachines
Electronic EngineeringElectricalMechanical Engineering
2002English

SEM Imaging of Resist Patterns Fabricated Through Imprint Lithography Techniques

Microscopy and Microanalysis
Instrumentation
2010English

Fabrication of Spin-Transfer Nano-Oscillator by Colloidal Lithography

Journal of Nanomaterials
Materials ScienceNanotechnologyNanoscience
2015English

Fabrication of Submicron Structures by Three-Dimensional Laser Lithography

JETP Letters
AstronomyPhysics
2014English

Photoluminescence Enhancement of Silicon Quantum Dot Monolayer by Plasmonic Substrate Fabricated by Nano-Imprint Lithography

Journal of Applied Physics
AstronomyPhysics
2017English

Edge and Plastic Mold.

Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering
Mechanical Engineering
1988English

Patterning Nonflat Substrates With a Low Pressure, Room Temperature, Imprint Lithography Process

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2001English

Fabrication of Mid-Infrared Frequency-Selective Surfaces by Soft Lithography

Applied Optics
2001English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2024 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy