Amanote Research
Register
Sign In
Effect of Oxygen Inclusion on Microstructure and Thermal Stability of Copper Nitride Thin Films
Journal of Materials Research
- United Kingdom
doi 10.1557/jmr.2007.0414
Full Text
Open PDF
Abstract
Available in
full text
Categories
Mechanics of Materials
Materials Science
Condensed Matter Physics
Mechanical Engineering
Date
November 1, 2007
Authors
Y. Du
R. Huang
R. Song
L.B. Ma
C. Liu
C.R. Li
Z.X. Cao
Publisher
Cambridge University Press (CUP)
Related search
Thermal Stability of Titanium Hydride Thin Films
Applied Physics Letters
Astronomy
Physics
Effect of Barrier Layers on the Texture and Microstructure of Copper Films
Materials Research Society Symposium - Proceedings
Mechanics of Materials
Materials Science
Condensed Matter Physics
Mechanical Engineering
Effect of Microstructure on Hardness of Submicrometre Thin Films and Nanostructured Devices
Materials Science and Technology
Mechanics of Materials
Materials Science
Condensed Matter Physics
Mechanical Engineering
Effect of Microstructure on the Thermal Properties of Sintered Iron-Copper Composites
Materials Research
Mechanics of Materials
Materials Science
Condensed Matter Physics
Mechanical Engineering
Effect of Annealing on Microstructure and Mechanical Properties of Magnetron Sputtered Cu Thin Films
Advances in Materials Science and Engineering
Materials Science
Engineering
Oxygen Pressure-Mediated Cation Stoichiometry, Microstructure, and Properties of Epitaxial Perovskite Thin Films
Thermal Stability of CdZnO Thin Films Grown by Molecular-Beam Epitaxy
Applied Surface Science
Surfaces
Astronomy
Condensed Matter Physics
Interfaces
Films
Coatings
Chemistry
Physics
The Effect of Microstructure and Surface Roughness on the Electrical Conductivity of Thin Copper and Silver Films Obtained by the Method of Magnetron Sputtering
Dynamics of Systems, Mechanisms and Machines
The Effect of Thermal Annealing on Photoelectrochemical Responses of WO3 Thin Films
Journal of Applied Physics
Astronomy
Physics