Properties of AlN Film Formed by Vacuum Arc Deposition Process

IEEJ Transactions on Fundamentals and Materials- Japan

doi 10.1541/ieejfms1990.111.12_1042

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Abstract

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Categories

Electronic Engineering

Date

January 1, 1991

Authors

Hirofumi Takikawa

Tadashi Ogiriyama

Tateki Sakakibara

Publisher

Institute of Electrical Engineers of Japan (IEE Japan)

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