Investigations of the Surface Chemistry of Silicon Substrates Etched in a Rf-Biased Inductively Coupled Fluorocarbon Plasma Using Fourier-Transform Infrared Ellipsometry

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films - United States
doi 10.1116/1.580976
Full Text
Abstract

Available in full text

Date
Authors
Publisher

American Vacuum Society

Related search

Growth Kinetics of Silicon Dioxide on Silicon in an Inductively Coupled Rf Plasma at Constant Anodization Currents

Journal of Applied Physics
AstronomyPhysics
1992English

Micro Variable Infrared Filter Using Magnetron Sputtering System Enhanced With an Inductively Coupled RF Plasma for CO2 Measurement.

SHINKU
2001English

Excellent Silicon Surface Passivation Achieved by Industrial Inductively Coupled Plasma Deposited Hydrogenated Intrinsic Amorphous Silicon Suboxide

International Journal of Photoenergy
Materials ScienceRenewable EnergyMolecular Physics,SustainabilityAtomicChemistryOpticsthe Environment
2014English

Investigation of Pyrolysis Gas Chemistry in an Inductively Coupled Plasma Facility

2016English

Black Silicon With Ultra-Low Surface Recombination Velocity Fabricated by Inductively Coupled Power Plasma

Physica Status Solidi - Rapid Research Letters
Materials ScienceCondensed Matter Physics
2018English

Investigations Into the Origins of Polyatomic Ions in Inductively Coupled Plasma-Mass Spectrometry

English

Fourier Transform Infrared and Fourier Transform Raman Spectroscopy of Polymers

Structure-Property Relations in Polymers
1993English

Surface Chemistry During Plasma Etching of Silicon

Pure and Applied Chemistry
ChemistryChemical Engineering
1996English

Near Surface CO2 Detection in an Inductively Coupled Plasma Facility Using Diode Laser Absorption

2011English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2024 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy