Selective Area Morphology Control of Self-Assembled Patterns Using Silsesquioxane-Containing Block Copolymers

Journal of Photopolymer Science and Technology - Japan
doi 10.2494/photopolymer.25.83
Full Text
Abstract

Available in full text

Date
Authors
Publisher

Technical Association of Photopolymers, Japan

Related search

Si-Containing Block Copolymers for Self-Assembled Nanolithography

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2008English

Optimization of Bioreducible Micelles Self-Assembled From Amphiphilic Hyperbranched Block Copolymers for Drug Delivery

Journal of Polymer Science, Part A: Polymer Chemistry
Organic ChemistryPolymersMaterials ChemistryPlastics
2018English

Nonionic Amphiphilic Linear Dendritic Block Copolymers. Solvent-Induced Self-Assembly and Morphology Tuning

English

Amphiphilic and Double Hydrophilic Block Copolymers Containing a Polydehydroalanine Block

Polymer Chemistry
Organic ChemistryPlasticsBiochemistryPolymersBioengineeringBiomedical Engineering
2017English

Geometric Control of Chemically Nano-Patterned Substrates for Feature Multiplication Using Directed Self-Assembly of Block Copolymers

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2012English

Selective Adsorption of Block Copolymers on Patterned Surfaces

Journal of Chemical Physics
MedicineTheoretical ChemistryAstronomyPhysicsPhysical
2006English

Self-Assembled Nanodot Fabrication by Using PS-PDMS Block Copolymer

2012English

Control of Network Structures in Block Copolymers

Kobunshi Ronbunshu
Materials SciencePolymersPlasticsChemical EngineeringEnvironmental Science
2019English

Self-Assembled Diblock Copolymers Applied in Semiconductor Capacitor Fabrication

MRS Bulletin
Materials ScienceTheoretical ChemistryCondensed Matter PhysicsPhysical
2001English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2024 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy