Achieving Uniformity in a Semiconductor Fabrication Process Using Spatial Modeling

Journal of the American Statistical Association - United Kingdom
doi 10.2307/2669600
Full Text
Abstract

Available in full text

Date
Authors
Publisher

JSTOR

Related search

The Modeling and Control of the Cluster Tool in Semiconductor Fabrication

English

Electromagnetic Modeling of Plasma Etch Chamber for Semiconductor Microchip Fabrication

PIERS Online
2009English

Three Dimensional Integration (3DI) of Semiconductor Circuit Layers: New Devices and Fabrication Process

English

Nonstationary Spatial Modeling Using Penalized Likelihood

Statistica Sinica
UncertaintyStatisticsProbability
2013English

Modeling Complex Spatial Dynamics of Two-Population Interaction in Urbanization Process

Journal of Geography and Geology
2010English

Spatial Mapping of Band Bending in Semiconductor Devices Using in Situ Quantum Sensors

Nature Electronics
InstrumentationElectronic EngineeringOpticalElectricalMagnetic MaterialsElectronic
2018English

Improved Beam Uniformity in Multimode Fibers Using Piezoelectric-Based Spatial Mode Scrambling for Medical Applications

Optical Engineering
EngineeringOpticsAtomicMolecular Physics,
2008English

Bayesian Point Process Modeling to Quantify Excess Risk in Spatial Epidemiology

English

Spatial Uniformity of Single Photon 1-D Imaging Detectors Using Superconducting Tunnel Junctions

2002English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2024 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy