Origin of Defects on Targets Used to Make Extreme Ultraviolet Mask Blanks

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films - United States
doi 10.1116/1.4788670
Full Text
Abstract

Available in full text

Date
Authors
Publisher

American Vacuum Society

Related search

Extreme Ultraviolet Interferometry

1997English

Extreme Ultraviolet Multilayer Reflectors

AIP Conference Proceedings
AstronomyPhysics
1986English

Extreme Ultraviolet Alignment and Testing of a Four-Mirror Ring Field Extreme Ultraviolet Optical System

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2000English

Erratum To: Reconstruction of Solar Extreme Ultraviolet Flux 1740 – 2015

Solar Physics
AstrophysicsAstronomyPlanetary ScienceSpace
2017English

Terbium-Based Extreme Ultraviolet Multilayers

Optics Letters
OpticsAtomicMolecular Physics,
2005English

Photoluminescence-Based Detection of Particle Contamination on Extreme Ultraviolet Reticles

Review of Scientific Instruments
MedicineInstrumentation
2015English

Empirical Determination of Extreme Ultraviolet Imager Background

Journal of Geophysical Research: Space Physics
2017English

Overcoming Mask Blank Defects in EUV Lithography

SPIE Newsroom
2009English

Extending Resonant Inelastic X-Ray Scattering to the Extreme Ultraviolet

Frontiers in Physics
Materials ScienceBiophysicsTheoretical ChemistryMathematical PhysicsAstronomyPhysicsPhysical
2015English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2024 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy