Special Section Guest Editorial: Control of Integrated Circuit Patterning Variance, Part 3: Pattern Roughness, Local Uniformity, and Stochastic Defects

Journal of Micro/ Nanolithography, MEMS, and MOEMS - United States
doi 10.1117/1.jmm.17.4.041000
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SPIE-Intl Soc Optical Eng

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